Developer to photoresist Na/KaOH for 2L

Developer for photo resist boards. Contents should be mixed with 2l water.

Please note! This chemical is highly caustic and protective wear is a must to prevent injury. The developer must be added to the water, not the other way!

WARNING:

Signal word: Danger

H314 Causes severe skin burns and eye damage.

P102 Keep out of the reach of children.
P280 Use protective gloves/protective clothing/eye protection/face protection.
P301+P330+P331 IF SWALLOWED: Rinse mouth. DO NOT induce vomiting.
P303+P361+P353 IF ON SKIN (including hair): Take off immediately all contaminated clothing. Rinse skin with water/shower.
P305+P351+P338 IF IN EYES: Rinse cautiously with water for several minutes. Remove any contact lenses if possible. Continue rinsing.